概述

The 2835 is a broadband plasma defect inspection system designed for optical patterned defect inspection. It is capable of discovering and monitoring yield-critical defects on devices with design nodes of 45nm or greater, including logic, memory, and specialty devices. The system is equipped with selectable wavelength illumination, imaging pixels, optic modes, and advanced algorithms for noise suppression and defect separation. This provides cost-effective, inline inspection control for critical levels. The 2835 is suitable for inline defect discovery and monitoring, hotspot discovery, engineering analysis, process window qualification, and photo cell monitoring.