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KLA 2835
  • KLA 2835
  • KLA 2835
  • KLA 2835
说明
无说明
配置
无配置
OEM 型号描述
The 2835 is a broadband plasma defect inspection system designed for optical patterned defect inspection. It is capable of discovering and monitoring yield-critical defects on devices with design nodes of 45nm or greater, including logic, memory, and specialty devices. The system is equipped with selectable wavelength illumination, imaging pixels, optic modes, and advanced algorithms for noise suppression and defect separation. This provides cost-effective, inline inspection control for critical levels. The 2835 is suitable for inline defect discovery and monitoring, hotspot discovery, engineering analysis, process window qualification, and photo cell monitoring.
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已验证

类别
Defect Inspection

上次验证: 60 多天前

物品主要详细信息

状况:

Used


运行状况:

未知


产品编号:

12840


晶圆尺寸:

12"/300mm


年份:

未知


Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available

KLA

2835

verified-listing-icon
已验证
类别
Defect Inspection
上次验证: 60 多天前
listing-photo-44c914f57040ad3ebc8f9a18847287ed073363863c6fdaf860de81d12bbcf900-https://d2pkkbyngq3xpw.cloudfront.net/moov_media/3.0-assets/photo-coming-soon-small.png
物品主要详细信息

状况:

Used


运行状况:

未知


产品编号:

12840


晶圆尺寸:

12"/300mm


年份:

未知


Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
说明
无说明
配置
无配置
OEM 型号描述
The 2835 is a broadband plasma defect inspection system designed for optical patterned defect inspection. It is capable of discovering and monitoring yield-critical defects on devices with design nodes of 45nm or greater, including logic, memory, and specialty devices. The system is equipped with selectable wavelength illumination, imaging pixels, optic modes, and advanced algorithms for noise suppression and defect separation. This provides cost-effective, inline inspection control for critical levels. The 2835 is suitable for inline defect discovery and monitoring, hotspot discovery, engineering analysis, process window qualification, and photo cell monitoring.
文件

无文件