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LAM RESEARCH / NOVELLUS CONCEPT THREE "C3" ALTUS
    说明
    无说明
    配置
    W
    OEM 型号描述
    Concept Three ALTUS is a 300mm process module that delivers leading productivity and technology for contact and local interconnect applications. It uses Pulsed Nucleation Layer (PNL™) technology to integrate a high throughput nucleation layer with chemical vapor deposition (CVD bulk deposition). The Multi-Station Sequential Deposition (MSSD) architecture enables the nucleation layer and CVD fill to be performed within the same ALTUS chamber. This results in highly conformal tungsten films with improved film properties, benchmark productivity, and superior production availability. The integrated PNL and CVD approach produces the lowest Cost of Ownership tungsten deposition solution in the industry.
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    LAM RESEARCH / NOVELLUS

    CONCEPT THREE "C3" ALTUS

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    已验证

    类别
    Deposition

    上次验证: 6 天前

    物品主要详细信息

    状况:

    Used


    运行状况:

    未知


    产品编号:

    117045


    晶圆尺寸:

    12"/300mm


    年份:

    2009


    Have Additional Questions?
    Logistics Support
    Available
    Money Back Guarantee
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    类似上架物品
    查看全部
    LAM RESEARCH / NOVELLUS CONCEPT THREE "C3" ALTUS

    LAM RESEARCH / NOVELLUS

    CONCEPT THREE "C3" ALTUS

    Deposition
    年份: 2009状况: 二手
    上次验证6 天前

    LAM RESEARCH / NOVELLUS

    CONCEPT THREE "C3" ALTUS

    verified-listing-icon
    已验证
    类别
    Deposition
    上次验证: 6 天前
    listing-photo-04e030f6a58e49869ba2bb69ab1ea09f-https://d2pkkbyngq3xpw.cloudfront.net/moov_media/3.0-assets/photo-coming-soon-small.png
    物品主要详细信息

    状况:

    Used


    运行状况:

    未知


    产品编号:

    117045


    晶圆尺寸:

    12"/300mm


    年份:

    2009


    Have Additional Questions?
    Logistics Support
    Available
    Money Back Guarantee
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    说明
    无说明
    配置
    W
    OEM 型号描述
    Concept Three ALTUS is a 300mm process module that delivers leading productivity and technology for contact and local interconnect applications. It uses Pulsed Nucleation Layer (PNL™) technology to integrate a high throughput nucleation layer with chemical vapor deposition (CVD bulk deposition). The Multi-Station Sequential Deposition (MSSD) architecture enables the nucleation layer and CVD fill to be performed within the same ALTUS chamber. This results in highly conformal tungsten films with improved film properties, benchmark productivity, and superior production availability. The integrated PNL and CVD approach produces the lowest Cost of Ownership tungsten deposition solution in the industry.
    文件

    无文件

    类似上架物品
    查看全部
    LAM RESEARCH / NOVELLUS CONCEPT THREE "C3" ALTUS

    LAM RESEARCH / NOVELLUS

    CONCEPT THREE "C3" ALTUS

    Deposition年份: 2009状况: 二手上次验证:6 天前
    LAM RESEARCH / NOVELLUS CONCEPT THREE "C3" ALTUS

    LAM RESEARCH / NOVELLUS

    CONCEPT THREE "C3" ALTUS

    Deposition年份: 2003状况: 二手上次验证:6 天前
    LAM RESEARCH / NOVELLUS CONCEPT THREE "C3" ALTUS

    LAM RESEARCH / NOVELLUS

    CONCEPT THREE "C3" ALTUS

    Deposition年份: 2006状况: 二手上次验证:60 多天前