说明
无说明配置
Ch Type: ChA1/A2/B1/B2/C1/C2=Etcher ChD1/D2=Post-processing Gas Type: O2/CHF3/He/SF6/Cl2/HBr/CH2F2/NF3/CH4/CH3F/C4F6/CF4/N2/C4F8/Ar Membrane: Silicon oxide film 4 Foup Ports Pump: Manufacturer: Edwards Model: STP-XA3203CV Quantity: 6 Chiller: Manufacturer: SMC Model: (Cathode) HRZ010-WS-X034; (Wall) HRW008-HS-X012 Quantity: (Cathode) 6 units; (Wall) 3 units; Total: 9 units Cassette B Door Open Failure occurred on LP2 (fault location not yet identified)OEM 型号描述
未提供文件
无文件
类别
Dry / Plasma Etch
上次验证： 3 天前
物品主要详细信息
状况：
Used
运行状况:
未知
产品编号：
148670
晶圆尺寸：
12"/300mm
年份：
未知
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
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APPLIED MATERIALS (AMAT)
CENTRIS
类别
Dry / Plasma Etch
上次验证： 3 天前
物品主要详细信息
状况：
Used
运行状况:
未知
产品编号：
148670
晶圆尺寸：
12"/300mm
年份：
未知
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
说明
无说明配置
Ch Type: ChA1/A2/B1/B2/C1/C2=Etcher ChD1/D2=Post-processing Gas Type: O2/CHF3/He/SF6/Cl2/HBr/CH2F2/NF3/CH4/CH3F/C4F6/CF4/N2/C4F8/Ar Membrane: Silicon oxide film 4 Foup Ports Pump: Manufacturer: Edwards Model: STP-XA3203CV Quantity: 6 Chiller: Manufacturer: SMC Model: (Cathode) HRZ010-WS-X034; (Wall) HRW008-HS-X012 Quantity: (Cathode) 6 units; (Wall) 3 units; Total: 9 units Cassette B Door Open Failure occurred on LP2 (fault location not yet identified)OEM 型号描述
未提供文件
无文件