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说明
Mainframe: 300mm配置
300mm DPS Metal chamber with 200mm ESCOEM 型号描述
The CENTURA AP DPS II delivers high-productivity silicon, metal, and dielectric etch. Etching is one of the most critical yet challenging of semiconductor production operations. Metal Etch文件
无文件
类别
Dry / Plasma Etch
上次验证： 30 多天前
物品主要详细信息
状况：
Used
运行状况:
未知
产品编号：
122819
晶圆尺寸：
8"/200mm
年份：
2001
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
APPLIED MATERIALS (AMAT)
CENTURA AP DPS II
类别
Dry / Plasma Etch
上次验证： 30 多天前
物品主要详细信息
状况：
Used
运行状况:
未知
产品编号：
122819
晶圆尺寸：
8"/200mm
年份：
2001
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
说明
Mainframe: 300mm配置
300mm DPS Metal chamber with 200mm ESCOEM 型号描述
The CENTURA AP DPS II delivers high-productivity silicon, metal, and dielectric etch. Etching is one of the most critical yet challenging of semiconductor production operations. Metal Etch文件
无文件