说明
Poly 2ch / Mesa 1ch配置
4C/HOEM 型号描述
The AMAT Centura DPS is a highly efficient semiconductor processing system with a unique architecture that groups four processing stations and two auxiliary chambers around a central transfer module housing an ultra-reliable magnetically-coupled vacuum robot. It is designed for ≤200mm wafer fabrication and supports various applications such as Chemical Vapor Deposition (CVD), epitaxy, etch, plasma nitridation, and Rapid Thermal Processing (RTP).文件
无文件
类别
Dry / Plasma Etch
上次验证： 26 天前
物品主要详细信息
状况：
Used
运行状况:
未知
产品编号：
76099
晶圆尺寸：
12"/300mm
年份：
2001
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
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APPLIED MATERIALS (AMAT)
CENTURA DPS
类别
Dry / Plasma Etch
上次验证： 26 天前
物品主要详细信息
状况：
Used
运行状况:
未知
产品编号：
76099
晶圆尺寸：
12"/300mm
年份：
2001
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
说明
Poly 2ch / Mesa 1ch配置
4C/HOEM 型号描述
The AMAT Centura DPS is a highly efficient semiconductor processing system with a unique architecture that groups four processing stations and two auxiliary chambers around a central transfer module housing an ultra-reliable magnetically-coupled vacuum robot. It is designed for ≤200mm wafer fabrication and supports various applications such as Chemical Vapor Deposition (CVD), epitaxy, etch, plasma nitridation, and Rapid Thermal Processing (RTP).文件
无文件