说明
Enabler Dielectric etch chamber Turbo pump: Shimadzu / TMP-3403LMC (A2) RF Match Box: Bias: 13.5 MHz(Bias) & 2 MHz(LF Bias) LF Bias Daihen RMN-50N1 (p/n : 0190-15322) Source 60 MHz Daihen AMN-30H (p/n : 0190-15323) Gate valve: Nor-Cal / NC-95-PP RF Generator: 13.56 MHz: ENI GHW-50A (p/n : 0190-15319) 2 MHz: MKS/ENI B-11002 (p/n : Spectrum 11002-00-07012) 60 MHz AE: Ovation 35162 (amat p/n : 0190-27049) FIB: eFib, wFib (Facilities Interface Box) Chamber Equip Cart: included配置
无配置OEM 型号描述
The Centura architecture clusters four processing stations and two auxiliary chambers around a central transfer module containing an ultra-reliable magnetically-coupled vacuum robot. To address advanced low k etch applications, the Applied Centura Enabler Etch system performs etch, strip and clean steps in a single chamber. The Enabler’s all-in-one capability streamlines the process flow for advanced chip designs and significantly reduces operating costs. Enabler Chamber: 300mm only.文件
无文件
APPLIED MATERIALS (AMAT)
CENTURA ENABLER ETCH
已验证
类别
Dry / Plasma Etch
上次验证： 60 多天前
物品主要详细信息
状况：
Used
运行状况:
未知
产品编号：
109956
晶圆尺寸：
12"/300mm
年份：
2007
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
类似上架物品
查看全部
APPLIED MATERIALS (AMAT)
CENTURA ENABLER ETCH
类别
Dry / Plasma Etch
上次验证： 60 多天前
物品主要详细信息
状况：
Used
运行状况:
未知
产品编号：
109956
晶圆尺寸：
12"/300mm
年份：
2007
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
说明
Enabler Dielectric etch chamber Turbo pump: Shimadzu / TMP-3403LMC (A2) RF Match Box: Bias: 13.5 MHz(Bias) & 2 MHz(LF Bias) LF Bias Daihen RMN-50N1 (p/n : 0190-15322) Source 60 MHz Daihen AMN-30H (p/n : 0190-15323) Gate valve: Nor-Cal / NC-95-PP RF Generator: 13.56 MHz: ENI GHW-50A (p/n : 0190-15319) 2 MHz: MKS/ENI B-11002 (p/n : Spectrum 11002-00-07012) 60 MHz AE: Ovation 35162 (amat p/n : 0190-27049) FIB: eFib, wFib (Facilities Interface Box) Chamber Equip Cart: included配置
无配置OEM 型号描述
The Centura architecture clusters four processing stations and two auxiliary chambers around a central transfer module containing an ultra-reliable magnetically-coupled vacuum robot. To address advanced low k etch applications, the Applied Centura Enabler Etch system performs etch, strip and clean steps in a single chamber. The Enabler’s all-in-one capability streamlines the process flow for advanced chip designs and significantly reduces operating costs. Enabler Chamber: 300mm only.文件
无文件