跳至主要内容
Moov logo

Moov Icon
APPLIED MATERIALS (AMAT) CENTURA HART AP
    说明
    1/1/26
    配置
    无配置
    OEM 型号描述
    Centura HART AP is likely designed to provide high-performance, precise etching for high aspect ratio trench applications. The system may also incorporate various features to ensure process control, uniformity, and efficiency, as these are typical qualities sought in etching equipment. "High Aspect Ratio Trench" refers to a trench (or hole) in a material that is much deeper than it is wide. The aspect ratio is the ratio of the depth of the trench to its width. In the context of semiconductor manufacturing, such as the creation of DRAM (dynamic random-access memory) cells, these high aspect ratio trenches are critical. These trenches are used to store charge, with the amount of charge representing the 0s and 1s of digital data. The higher the aspect ratio, the more charge the trench can store, which can help increase the storage capacity of the memory cell.
    文件

    无文件

    verified-listing-icon

    已验证

    类别
    Dry / Plasma Etch

    上次验证: 27 天前

    物品主要详细信息

    状况:

    Used


    运行状况:

    未知


    产品编号:

    148128


    晶圆尺寸:

    8"/200mm


    年份:

    未知


    Logistics Support
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    类似上架物品
    查看全部
    APPLIED MATERIALS (AMAT) CENTURA HART AP

    APPLIED MATERIALS (AMAT)

    CENTURA HART AP

    Dry / Plasma Etch
    年份: 0状况: 二手
    上次验证27 天前

    APPLIED MATERIALS (AMAT)

    CENTURA HART AP

    verified-listing-icon
    已验证
    类别
    Dry / Plasma Etch
    上次验证: 27 天前
    listing-photo-d115fed2ac5243fb9b715a9fac92b990-https://d2pkkbyngq3xpw.cloudfront.net/moov_media/3.0-assets/photo-coming-soon-small.png
    物品主要详细信息

    状况:

    Used


    运行状况:

    未知


    产品编号:

    148128


    晶圆尺寸:

    8"/200mm


    年份:

    未知


    Logistics Support
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    说明
    1/1/26
    配置
    无配置
    OEM 型号描述
    Centura HART AP is likely designed to provide high-performance, precise etching for high aspect ratio trench applications. The system may also incorporate various features to ensure process control, uniformity, and efficiency, as these are typical qualities sought in etching equipment. "High Aspect Ratio Trench" refers to a trench (or hole) in a material that is much deeper than it is wide. The aspect ratio is the ratio of the depth of the trench to its width. In the context of semiconductor manufacturing, such as the creation of DRAM (dynamic random-access memory) cells, these high aspect ratio trenches are critical. These trenches are used to store charge, with the amount of charge representing the 0s and 1s of digital data. The higher the aspect ratio, the more charge the trench can store, which can help increase the storage capacity of the memory cell.
    文件

    无文件

    类似上架物品
    查看全部
    APPLIED MATERIALS (AMAT) CENTURA HART AP

    APPLIED MATERIALS (AMAT)

    CENTURA HART AP

    Dry / Plasma Etch年份: 0状况: 二手上次验证:27 天前
    APPLIED MATERIALS (AMAT) CENTURA HART AP

    APPLIED MATERIALS (AMAT)

    CENTURA HART AP

    Dry / Plasma Etch年份: 0状况: 二手上次验证:28 天前
    APPLIED MATERIALS (AMAT) CENTURA HART AP

    APPLIED MATERIALS (AMAT)

    CENTURA HART AP

    Dry / Plasma Etch年份: 0状况: 二手上次验证:28 天前