说明
Metal CVD (Chemical Vapor Deposition)配置
Centura 5200 Ti/TiN MCVD Install Type:Stand Alone Software Version:B4226 Is System On-Line? Yes CE Mark Certified? Yes Clean Room Manuals:No Standard Manuals:No OEM Audit Available? Yes Decontamination Report Exists? Yes Can Produce Wafers AS IS? Yes Any Known Field Modifications? No All Cables Present? Yes Mainframe Type: Centura (Common) System Configuration Chamber / Process Position A:CVD / TiN Position B:CVD / TiN Position C:CVD / Ti Position D:CVD / Ti Directory of Chamber Types for TxZ, TixZ:MCVD Multi-Slot Cooldown:Cooldown Wafer Orienter:Orienter Mainframe Items Signal Lamp Tower:Yes Loadlock Type :Wide body Wafer Mapping:Fast Wafer Slide Sensor:Yes Bolt-On-SMIF:Yes SMIF Loader Make/Model:ASYST/LPT2200 Robot Type:HP+ Blade Type:Quartz Transfer Lid Hoist:No Wafer on Blade Sensor:OTF SBC Version:V452 Remote Service Monitors:No GEMS:No RF Generator Details Chamber Position :Mfgr. / Model Position A :AE / PDX 900-2V Position B: AE / PDX 900-2V Position C:AE / PDX 900-2V Position D:AE / PDX 900-2V Dep Chamber Roughing Pumps Dep Chamber Pump Manufacturer:Edward Model:iH600 Quantity Required:4 Included With System:No Load Lock Pump Manufacturer:Edward Model:iH80 Included With System:No Transfer Chamber Pump Manufacturer:Edward Model:iH80 Included With System:No AMAT Heat Exchanger Model:Steelhead Quantity Required:2 Included With System:No Gas Box Configuration Gas Delivery Type: SLD Gas Panel Interface Type:Standard Gas Panel Exhaust:Top Liquid Delivery Type:TICL4 Gas Box Configuration Gas Line # Gas / Flow (sccm) / MFC Mfgr. / MFC Model 1 Ar / 1000 / STEC / SEC4400M 2 N2 / 1000 / STEC / SEC4400M 3 H2 / 5000 / STEC / SEC4400M 4 Ar / 10000 / STEC / SEC4400M 5 Cl2 / 500 / STEC / SEC4400M 6 Ar / 1000 / STEC / SEC4400M 7 He / 3000 / STEC / SEC4400M 8 NH3 / 1000 / STEC / SEC4400MOEM 型号描述
Reactor/ MOCVD文件
无文件
APPLIED MATERIALS (AMAT)
CENTURA I PHASE II
已验证
类别
Dry / Plasma Etch
上次验证： 16 天前
物品主要详细信息
状况：
Used
运行状况:
未知
产品编号：
77563
晶圆尺寸：
8"/200mm
年份：
2002
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
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APPLIED MATERIALS (AMAT)
CENTURA I PHASE II
类别
Dry / Plasma Etch
上次验证： 16 天前
物品主要详细信息
状况：
Used
运行状况:
未知
产品编号：
77563
晶圆尺寸：
8"/200mm
年份：
2002
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
说明
Metal CVD (Chemical Vapor Deposition)配置
Centura 5200 Ti/TiN MCVD Install Type:Stand Alone Software Version:B4226 Is System On-Line? Yes CE Mark Certified? Yes Clean Room Manuals:No Standard Manuals:No OEM Audit Available? Yes Decontamination Report Exists? Yes Can Produce Wafers AS IS? Yes Any Known Field Modifications? No All Cables Present? Yes Mainframe Type: Centura (Common) System Configuration Chamber / Process Position A:CVD / TiN Position B:CVD / TiN Position C:CVD / Ti Position D:CVD / Ti Directory of Chamber Types for TxZ, TixZ:MCVD Multi-Slot Cooldown:Cooldown Wafer Orienter:Orienter Mainframe Items Signal Lamp Tower:Yes Loadlock Type :Wide body Wafer Mapping:Fast Wafer Slide Sensor:Yes Bolt-On-SMIF:Yes SMIF Loader Make/Model:ASYST/LPT2200 Robot Type:HP+ Blade Type:Quartz Transfer Lid Hoist:No Wafer on Blade Sensor:OTF SBC Version:V452 Remote Service Monitors:No GEMS:No RF Generator Details Chamber Position :Mfgr. / Model Position A :AE / PDX 900-2V Position B: AE / PDX 900-2V Position C:AE / PDX 900-2V Position D:AE / PDX 900-2V Dep Chamber Roughing Pumps Dep Chamber Pump Manufacturer:Edward Model:iH600 Quantity Required:4 Included With System:No Load Lock Pump Manufacturer:Edward Model:iH80 Included With System:No Transfer Chamber Pump Manufacturer:Edward Model:iH80 Included With System:No AMAT Heat Exchanger Model:Steelhead Quantity Required:2 Included With System:No Gas Box Configuration Gas Delivery Type: SLD Gas Panel Interface Type:Standard Gas Panel Exhaust:Top Liquid Delivery Type:TICL4 Gas Box Configuration Gas Line # Gas / Flow (sccm) / MFC Mfgr. / MFC Model 1 Ar / 1000 / STEC / SEC4400M 2 N2 / 1000 / STEC / SEC4400M 3 H2 / 5000 / STEC / SEC4400M 4 Ar / 10000 / STEC / SEC4400M 5 Cl2 / 500 / STEC / SEC4400M 6 Ar / 1000 / STEC / SEC4400M 7 He / 3000 / STEC / SEC4400M 8 NH3 / 1000 / STEC / SEC4400MOEM 型号描述
Reactor/ MOCVD文件
无文件