说明
ETCH配置
ETCHOEM 型号描述
The Centura II eMax CT+ system is targeted for the most demanding etch applications, including self-aligned, high aspect ratio and logic contacts, as well as dual damascene and low k dielectric films. It can accommodate up to 4 process chambers and 2 auxiliary chambers.文件
无文件
APPLIED MATERIALS (AMAT)
CENTURA II EMAX CT+
已验证
类别
Dry / Plasma Etch
上次验证： 60 多天前
物品主要详细信息
状况：
Used
运行状况:
未知
产品编号：
23723
晶圆尺寸：
12"/300mm
年份：
未知
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
APPLIED MATERIALS (AMAT)
CENTURA II EMAX CT+
类别
Dry / Plasma Etch
上次验证： 60 多天前
物品主要详细信息
状况：
Used
运行状况:
未知
产品编号：
23723
晶圆尺寸：
12"/300mm
年份：
未知
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
说明
ETCH配置
ETCHOEM 型号描述
The Centura II eMax CT+ system is targeted for the most demanding etch applications, including self-aligned, high aspect ratio and logic contacts, as well as dual damascene and low k dielectric films. It can accommodate up to 4 process chambers and 2 auxiliary chambers.文件
无文件