说明
Plasma配置
2x DTM chambers (Chlorine etcher), 1x Super E chamber (Fluorine etcher )OEM 型号描述
The AMAT / APPLIED MATERIALS Centura IPS (induced plasma source) is a dialectric etch system. This AMAT Centura is configured with Inductively Coupled Parallel Plate Semiconductor Dielectric Etch (IPS) chamber. The IPS chamber can be used alone or with other chambers on the Centura platform. The AMAT / APPLIED MATERIALS Centura IPS can be configured for wafer sizes up to 300mm. Applications for the AMAT / APPLIED MATERIALS Centura IPS include etching dual damascene structures in copper-based devices.文件
无文件
类别
Dry / Plasma Etch
上次验证： 13 天前
物品主要详细信息
状况：
Used
运行状况:
未知
产品编号：
142376
晶圆尺寸：
未知
年份：
2018
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
APPLIED MATERIALS (AMAT)
CENTURA IPS
类别
Dry / Plasma Etch
上次验证： 13 天前
物品主要详细信息
状况：
Used
运行状况:
未知
产品编号：
142376
晶圆尺寸：
未知
年份：
2018
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
说明
Plasma配置
2x DTM chambers (Chlorine etcher), 1x Super E chamber (Fluorine etcher )OEM 型号描述
The AMAT / APPLIED MATERIALS Centura IPS (induced plasma source) is a dialectric etch system. This AMAT Centura is configured with Inductively Coupled Parallel Plate Semiconductor Dielectric Etch (IPS) chamber. The IPS chamber can be used alone or with other chambers on the Centura platform. The AMAT / APPLIED MATERIALS Centura IPS can be configured for wafer sizes up to 300mm. Applications for the AMAT / APPLIED MATERIALS Centura IPS include etching dual damascene structures in copper-based devices.文件
无文件