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市场 > Dry / Plasma Etch > APPLIED MATERIALS (AMAT) > OPUS ADVANTEDGE METAL ETCH

OPUS ADVANTEDGE METAL ETCH

概述

For etching metals, the Applied Opus AdvantEdge Metal Etch uses an optimized 5-chamber platform configuration that enables customers to extend aluminum interconnect technology and productivity to sub-70nm dimensions for flash and DRAM memory applications.

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