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DIENER ELECTRONIC NANO
    说明
    Plasma
    配置
    无配置
    OEM 型号描述
    NANO is a low-pressure plasma system. The cabinets of the system vary depending on the components and options chosen by the user. The chamber volume of the system also varies depending on the version selected. The power supply for the table-top system is 230 V AC, while the standalone system requires 400 V AC with 3 phases. This system is designed to provide efficient and reliable plasma processing for a variety of applications.
    文件

    无文件

    类别
    Dry / Plasma Etch

    上次验证: 60 多天前

    物品主要详细信息

    状况:

    Used


    运行状况:

    未知


    产品编号:

    120828


    晶圆尺寸:

    未知


    年份:

    2006


    Logistics Support
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available

    DIENER ELECTRONIC

    NANO

    verified-listing-icon
    已验证
    类别
    Dry / Plasma Etch
    上次验证: 60 多天前
    listing-photo-7f81f16f9461455baeb76fb692962391-https://d2pkkbyngq3xpw.cloudfront.net/moov_media/3.0-assets/photo-coming-soon-small.png
    物品主要详细信息

    状况:

    Used


    运行状况:

    未知


    产品编号:

    120828


    晶圆尺寸:

    未知


    年份:

    2006


    Logistics Support
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    说明
    Plasma
    配置
    无配置
    OEM 型号描述
    NANO is a low-pressure plasma system. The cabinets of the system vary depending on the components and options chosen by the user. The chamber volume of the system also varies depending on the version selected. The power supply for the table-top system is 230 V AC, while the standalone system requires 400 V AC with 3 phases. This system is designed to provide efficient and reliable plasma processing for a variety of applications.
    文件

    无文件