说明
无说明配置
Type: 300mm M712 mainframe M711 setup one Etch chamber Software revision: 1.07 PMv.02.16M Etcher, 12" (3) Cassettes Positions SECS II Interface: HSMS Neslab coolflow III Chiller Power supply: 208 VAC, 3-Phase, 50/60 Hz Mainframe: Robot P/N: CR-712V HITACHI 3 position Loader Chamber: ESC Type: Bipolar Endpoint type: Hitachi EPD monitor ePMv02.16M SHIMAZU EC TMP 3203LMC-K1 EC TMP Controller DAIHEN ES7-IIA EC Source generator PEARL CF-500-400K EC Bias generator Gas configuration: Line / EC1 / Strip 1 / Ar 2 / C12 3 / SF6 4 / HBr 5 / CF3 6 / CH4 7 / NF3 8 / O2 9 / N2 10/ SF6 11/ C12 12/ O2OEM 型号描述
未提供文件
无文件
HITACHI
M 712
已验证
类别
Dry / Plasma Etch
上次验证： 60 多天前
物品主要详细信息
状况：
Used
运行状况:
未知
产品编号：
65310
晶圆尺寸：
12"/300mm
年份：
2006
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
HITACHI
M 712
类别
Dry / Plasma Etch
上次验证： 60 多天前
物品主要详细信息
状况：
Used
运行状况:
未知
产品编号：
65310
晶圆尺寸：
12"/300mm
年份：
2006
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
说明
无说明配置
Type: 300mm M712 mainframe M711 setup one Etch chamber Software revision: 1.07 PMv.02.16M Etcher, 12" (3) Cassettes Positions SECS II Interface: HSMS Neslab coolflow III Chiller Power supply: 208 VAC, 3-Phase, 50/60 Hz Mainframe: Robot P/N: CR-712V HITACHI 3 position Loader Chamber: ESC Type: Bipolar Endpoint type: Hitachi EPD monitor ePMv02.16M SHIMAZU EC TMP 3203LMC-K1 EC TMP Controller DAIHEN ES7-IIA EC Source generator PEARL CF-500-400K EC Bias generator Gas configuration: Line / EC1 / Strip 1 / Ar 2 / C12 3 / SF6 4 / HBr 5 / CF3 6 / CH4 7 / NF3 8 / O2 9 / N2 10/ SF6 11/ C12 12/ O2OEM 型号描述
未提供文件
无文件