2300 VERSYS KIYO
概述
The 2300 Versys Kiyo is a manufacturing tool designed for 65 nm and beyond. It provides excellent uniformity and defect control on a reliable wafer transport system. The symmetric chamber and radial tuning features produce uniform etch results for advanced devices. It employs proprietary technology for process repeatability, low defect, and metal contamination results. It supports conventional applications such as gate and shallow trench isolation (STI) and emerging applications such as high k dielectric removal, critical spacer etch, and lithography-enabling etch steps. The system can be upgraded from the 2300 Versys Star, providing an investment-extending strategy.
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LAM RESEARCH CORPORATION
2300 VERSYS KIYO
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Dry / Plasma Etch年份: 状况: 二手上次验证19 天前LAM RESEARCH CORPORATION
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Dry / Plasma Etch年份: 状况: 二手上次验证60 多天前