说明
Etch / ashing system配置
MW chamberOEM 型号描述
Lam’s 2300 Versys Star silicon etch system is designed to meet the challenging needs of sub-90-nm technologies. It delivers superior performance on complex film stacks and meets the requirements for next-generation silicon etch processes to sub-65 nm. The system provides excellent CD bias uniformity, enabled by the industry’s first technologies for tuning gas flows and wafer temperature with step-by-step settings. This allows flexibility in designing the process across the wafer and between steps, leading to a larger process window that can accommodate an extensive variety of applications, wafer types, and film types. The 2300 Versys Star is available as an upgrade to existing 2300 Versys systems.文件
无文件
类别
Dry / Plasma Etch
上次验证： 13 天前
物品主要详细信息
状况：
Used
运行状况:
未知
产品编号：
152699
晶圆尺寸：
12"/300mm
年份：
2004
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
LAM RESEARCH CORPORATION
2300 VERSYS STAR
类别
Dry / Plasma Etch
上次验证： 13 天前
物品主要详细信息
状况：
Used
运行状况:
未知
产品编号：
152699
晶圆尺寸：
12"/300mm
年份：
2004
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
说明
Etch / ashing system配置
MW chamberOEM 型号描述
Lam’s 2300 Versys Star silicon etch system is designed to meet the challenging needs of sub-90-nm technologies. It delivers superior performance on complex film stacks and meets the requirements for next-generation silicon etch processes to sub-65 nm. The system provides excellent CD bias uniformity, enabled by the industry’s first technologies for tuning gas flows and wafer temperature with step-by-step settings. This allows flexibility in designing the process across the wafer and between steps, leading to a larger process window that can accommodate an extensive variety of applications, wafer types, and film types. The 2300 Versys Star is available as an upgrade to existing 2300 Versys systems.文件
无文件