跳至主要内容
We value your privacy

We and our selected partners use cookies to enhance your browsing experience, serve personalized content, and analyze our traffic. By clicking "Accept All", you consent to our use of cookies. 阅读更多

Moov logo

Moov Icon
LAM RESEARCH CORPORATION 2300 VERSYS KIYO45
  • LAM RESEARCH CORPORATION 2300 VERSYS KIYO45
  • LAM RESEARCH CORPORATION 2300 VERSYS KIYO45
  • LAM RESEARCH CORPORATION 2300 VERSYS KIYO45
  • LAM RESEARCH CORPORATION 2300 VERSYS KIYO45
  • LAM RESEARCH CORPORATION 2300 VERSYS KIYO45
  • LAM RESEARCH CORPORATION 2300 VERSYS KIYO45
  • LAM RESEARCH CORPORATION 2300 VERSYS KIYO45
说明
无说明
配置
LAM Kiyo 45 Chamber Has missing parts
OEM 型号描述
The 2300 Versys Kiyo45 is a Reactive Ion Etch (RIE) system from Lam Research, part of the Kiyo Product Family. It is used to shape the electrically active materials of a semiconductor device with high precision and consistency. The Kiyo product family is known for its high-performance capabilities and productivity. The Versys Kiyo45 is used for various applications, including shallow trench isolation, source/drain engineering, high-k/metal gate, FinFET and tri-gate, and multi-patterning. It enables processing at sub-65 nm technology nodes.
文件

无文件

类别
Dry / Plasma Etch

上次验证: 60 多天前

物品主要详细信息

状况:

Parts Tool


运行状况:

Deinstalled


产品编号:

97779


晶圆尺寸:

未知


年份:

未知


Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available

LAM RESEARCH CORPORATION

2300 VERSYS KIYO45

verified-listing-icon
已验证
类别
Dry / Plasma Etch
上次验证: 60 多天前
listing-photo-6198f18ff320440a86d3957825461c89-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/45207/6198f18ff320440a86d3957825461c89/73f281c59e354f21bc41ea0d488e12b8_6dd49c2904154ecda2b9734fd5dc6afa1201a_mw.jpeg
listing-photo-6198f18ff320440a86d3957825461c89-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/45207/6198f18ff320440a86d3957825461c89/84271aad9ff34da4b6a636ff75164b43_189af2008d4c419691470e0ed08c6bc91201a_mw.jpeg
listing-photo-6198f18ff320440a86d3957825461c89-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/45207/6198f18ff320440a86d3957825461c89/47dffc6898e34cbd8da808d79c678977_0deb65a9592143d4a8ced80527e91e9f1201a_mw.jpeg
listing-photo-6198f18ff320440a86d3957825461c89-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/45207/6198f18ff320440a86d3957825461c89/46d8220378364b0c960a3bad86399c8c_295e22c0cf4545b6a1b05f1dfec65189_mw.jpeg
listing-photo-6198f18ff320440a86d3957825461c89-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/45207/6198f18ff320440a86d3957825461c89/3757de7ec0354764bb76bccc27487f81_05fc8b67ec694d37a7dba637bc870841_mw.jpeg
listing-photo-6198f18ff320440a86d3957825461c89-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/45207/6198f18ff320440a86d3957825461c89/ce588755bc4c449abd703b6a2dc075df_f8cc16e01dfb488dada3951e7802eef4_mw.jpeg
listing-photo-6198f18ff320440a86d3957825461c89-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/45207/6198f18ff320440a86d3957825461c89/ee0bce7831684055962357527c7d10c5_a681f7b66380437cac916c1c3d8d6b2c1201a_mw.jpeg
物品主要详细信息

状况:

Parts Tool


运行状况:

Deinstalled


产品编号:

97779


晶圆尺寸:

未知


年份:

未知


Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
说明
无说明
配置
LAM Kiyo 45 Chamber Has missing parts
OEM 型号描述
The 2300 Versys Kiyo45 is a Reactive Ion Etch (RIE) system from Lam Research, part of the Kiyo Product Family. It is used to shape the electrically active materials of a semiconductor device with high precision and consistency. The Kiyo product family is known for its high-performance capabilities and productivity. The Versys Kiyo45 is used for various applications, including shallow trench isolation, source/drain engineering, high-k/metal gate, FinFET and tri-gate, and multi-patterning. It enables processing at sub-65 nm technology nodes.
文件

无文件