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LAM RESEARCH CORPORATION TCP 9600SE
    说明
    ETCH
    配置
    无配置
    OEM 型号描述
    The TCP 9600SE is a high density, low pressure etch system from Lam’s TCP product line. It incorporates the Company’s patented Transformer Coupled Plasma source technology for etching 0.35 micron and smaller geometries. It is used for metal etch applications and is designed to offer customers a reliable, lower cost of ownership solution to their advanced needs. The system operates at lower pressures for improved pattern transfer control and higher plasma density for higher etch rates. It is available as a stand-alone, single wafer tool, or on the Alliance multichamber cluster platform.
    文件

    无文件

    LAM RESEARCH CORPORATION

    TCP 9600SE

    verified-listing-icon

    已验证

    类别
    Dry / Plasma Etch

    上次验证: 60 多天前

    物品主要详细信息

    状况:

    Used


    运行状况:

    未知


    产品编号:

    105976


    晶圆尺寸:

    8"/200mm


    年份:

    未知


    Have Additional Questions?
    Logistics Support
    Available
    Money Back Guarantee
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    类似上架物品
    查看全部
    LAM RESEARCH CORPORATION TCP 9600SE

    LAM RESEARCH CORPORATION

    TCP 9600SE

    Dry / Plasma Etch
    年份: 0状况: 二手
    上次验证30 多天前

    LAM RESEARCH CORPORATION

    TCP 9600SE

    verified-listing-icon
    已验证
    类别
    Dry / Plasma Etch
    上次验证: 60 多天前
    listing-photo-2613e08a289348a794f2d2a222c4e2b9-https://d2pkkbyngq3xpw.cloudfront.net/moov_media/3.0-assets/photo-coming-soon-small.png
    物品主要详细信息

    状况:

    Used


    运行状况:

    未知


    产品编号:

    105976


    晶圆尺寸:

    8"/200mm


    年份:

    未知


    Have Additional Questions?
    Logistics Support
    Available
    Money Back Guarantee
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    说明
    ETCH
    配置
    无配置
    OEM 型号描述
    The TCP 9600SE is a high density, low pressure etch system from Lam’s TCP product line. It incorporates the Company’s patented Transformer Coupled Plasma source technology for etching 0.35 micron and smaller geometries. It is used for metal etch applications and is designed to offer customers a reliable, lower cost of ownership solution to their advanced needs. The system operates at lower pressures for improved pattern transfer control and higher plasma density for higher etch rates. It is available as a stand-alone, single wafer tool, or on the Alliance multichamber cluster platform.
    文件

    无文件

    类似上架物品
    查看全部
    LAM RESEARCH CORPORATION TCP 9600SE

    LAM RESEARCH CORPORATION

    TCP 9600SE

    Dry / Plasma Etch年份: 0状况: 二手上次验证:30 多天前
    LAM RESEARCH CORPORATION TCP 9600SE

    LAM RESEARCH CORPORATION

    TCP 9600SE

    Dry / Plasma Etch年份: 0状况: 二手上次验证:60 多天前
    LAM RESEARCH CORPORATION TCP 9600SE

    LAM RESEARCH CORPORATION

    TCP 9600SE

    Dry / Plasma Etch年份: 0状况: 二手上次验证:60 多天前