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LAM RESEARCH CORPORATION TCP 9400PTX
    说明
    Polysilicon Etch
    配置
    无配置
    OEM 型号描述
    The TCP 9400PTX is a high-density, low-pressure etch system from Lam Research’s TCP product line. It incorporates the company’s patented Transformer Coupled Plasma source technology for etching 0.25 micron and smaller geometries. The system is designed for polysilicon, polycide, and shallow trench isolation etch applications. It operates at lower pressures for improved pattern transfer control and higher plasma density for higher etch rates. Independent power control to the lower electrode improves etch results across a wider process window. The TCP 9400PTX is designed to offer customers a reliable, lower cost of ownership solution for their advanced processing needs and is available as a stand-alone, single wafer configuration or in conjunction with the Alliance multi-chamber cluster platform.
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    verified-listing-icon

    已验证

    类别
    Dry / Plasma Etch

    上次验证: 15 天前

    物品主要详细信息

    状况:

    Used


    运行状况:

    未知


    产品编号:

    147734


    晶圆尺寸:

    6"/150mm


    年份:

    未知


    Logistics Support
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    类似上架物品
    查看全部
    LAM RESEARCH CORPORATION TCP 9400PTX

    LAM RESEARCH CORPORATION

    TCP 9400PTX

    Dry / Plasma Etch
    年份: 0状况: 二手
    上次验证9 天前

    LAM RESEARCH CORPORATION

    TCP 9400PTX

    verified-listing-icon
    已验证
    类别
    Dry / Plasma Etch
    上次验证: 15 天前
    listing-photo-27965cf42ecc413c94cb4919829aae48-https://d2pkkbyngq3xpw.cloudfront.net/moov_media/3.0-assets/photo-coming-soon-small.png
    物品主要详细信息

    状况:

    Used


    运行状况:

    未知


    产品编号:

    147734


    晶圆尺寸:

    6"/150mm


    年份:

    未知


    Logistics Support
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    说明
    Polysilicon Etch
    配置
    无配置
    OEM 型号描述
    The TCP 9400PTX is a high-density, low-pressure etch system from Lam Research’s TCP product line. It incorporates the company’s patented Transformer Coupled Plasma source technology for etching 0.25 micron and smaller geometries. The system is designed for polysilicon, polycide, and shallow trench isolation etch applications. It operates at lower pressures for improved pattern transfer control and higher plasma density for higher etch rates. Independent power control to the lower electrode improves etch results across a wider process window. The TCP 9400PTX is designed to offer customers a reliable, lower cost of ownership solution for their advanced processing needs and is available as a stand-alone, single wafer configuration or in conjunction with the Alliance multi-chamber cluster platform.
    文件

    无文件

    类似上架物品
    查看全部
    LAM RESEARCH CORPORATION TCP 9400PTX

    LAM RESEARCH CORPORATION

    TCP 9400PTX

    Dry / Plasma Etch年份: 0状况: 二手上次验证:9 天前
    LAM RESEARCH CORPORATION TCP 9400PTX

    LAM RESEARCH CORPORATION

    TCP 9400PTX

    Dry / Plasma Etch年份: 0状况: 二手上次验证:15 天前
    LAM RESEARCH CORPORATION TCP 9400PTX

    LAM RESEARCH CORPORATION

    TCP 9400PTX

    Dry / Plasma Etch年份: 0状况: 二手上次验证:15 天前