说明
无说明配置
无配置OEM 型号描述
Built on the paradigmE product architecture, paradigmE Si incorporates enhancements to enable customers to run the chemistries required for poly-silicon applications. The system features Mattson Technology's proprietary Faraday shield designed to improve etch process control and enhance mean-time-between-clean (MTBC) performance by up to three times over competitive systems. The paradigmE Si also enables true independent control of ion density and energy, providing improved profile control and minimized sputtering to reduce maintenance costs for the lowest cost-of-ownership.文件
无文件
类别
Dry / Plasma Etch
上次验证： 13 天前
物品主要详细信息
状况：
Used
运行状况:
未知
产品编号：
14189
晶圆尺寸：
12"/300mm
年份：
2012
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
MATTSON
paradigmE SI
类别
Dry / Plasma Etch
上次验证： 13 天前
物品主要详细信息
状况：
Used
运行状况:
未知
产品编号：
14189
晶圆尺寸：
12"/300mm
年份：
2012
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
说明
无说明配置
无配置OEM 型号描述
Built on the paradigmE product architecture, paradigmE Si incorporates enhancements to enable customers to run the chemistries required for poly-silicon applications. The system features Mattson Technology's proprietary Faraday shield designed to improve etch process control and enhance mean-time-between-clean (MTBC) performance by up to three times over competitive systems. The paradigmE Si also enables true independent control of ion density and energy, providing improved profile control and minimized sputtering to reduce maintenance costs for the lowest cost-of-ownership.文件
无文件