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MATTSON paradigm SI
    说明
    无说明
    配置
    无配置
    OEM 型号描述
    Built on the paradigm product architecture, paradigm Si incorporates enhancements to enable customers to run the chemistries required for poly-silicon applications. The system features Mattson Technology's proprietary Faraday shield designed to improve etch process control and enhance mean-time-between-clean (MTBC) performance by up to three times over competitive systems. The paradigm Si also enables true independent control of ion density and energy, providing improved profile control and minimized sputtering to reduce maintenance costs for the lowest cost-of-ownership. The paradigm Si is specifically targeted at semi-critical poly etch applications by providing excellent process performance with over 30% better cost-of ownership advantages over any competitive etch system currently on the market.
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    MATTSON

    paradigm SI

    verified-listing-icon

    已验证

    类别
    Dry / Plasma Etch

    上次验证: 60 多天前

    物品主要详细信息

    状况:

    Used


    运行状况:

    未知


    产品编号:

    66266


    晶圆尺寸:

    12"/300mm


    年份:

    2011


    Have Additional Questions?
    Logistics Support
    Available
    Money Back Guarantee
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    类似上架物品
    查看全部
    MATTSON paradigm SI

    MATTSON

    paradigm SI

    Dry / Plasma Etch
    年份: 2011状况: 二手
    上次验证60 多天前

    MATTSON

    paradigm SI

    verified-listing-icon
    已验证
    类别
    Dry / Plasma Etch
    上次验证: 60 多天前
    listing-photo-9c899b1cd7f3496bb9e9cf1867a2348b-https://d2pkkbyngq3xpw.cloudfront.net/moov_media/3.0-assets/photo-coming-soon-small.png
    物品主要详细信息

    状况:

    Used


    运行状况:

    未知


    产品编号:

    66266


    晶圆尺寸:

    12"/300mm


    年份:

    2011


    Have Additional Questions?
    Logistics Support
    Available
    Money Back Guarantee
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    说明
    无说明
    配置
    无配置
    OEM 型号描述
    Built on the paradigm product architecture, paradigm Si incorporates enhancements to enable customers to run the chemistries required for poly-silicon applications. The system features Mattson Technology's proprietary Faraday shield designed to improve etch process control and enhance mean-time-between-clean (MTBC) performance by up to three times over competitive systems. The paradigm Si also enables true independent control of ion density and energy, providing improved profile control and minimized sputtering to reduce maintenance costs for the lowest cost-of-ownership. The paradigm Si is specifically targeted at semi-critical poly etch applications by providing excellent process performance with over 30% better cost-of ownership advantages over any competitive etch system currently on the market.
    文件

    无文件

    类似上架物品
    查看全部
    MATTSON paradigm SI

    MATTSON

    paradigm SI

    Dry / Plasma Etch年份: 2011状况: 二手上次验证:60 多天前
    MATTSON paradigm SI

    MATTSON

    paradigm SI

    Dry / Plasma Etch年份: 2012状况: 二手上次验证:60 多天前
    MATTSON paradigm SI

    MATTSON

    paradigm SI

    Dry / Plasma Etch年份: 2011状况: 二手上次验证:60 多天前