说明
无说明配置
无配置OEM 型号描述
The March Jupiter III is a parallel plate reactive ion etcher, which offers fast, uniform, and selective etching. The Jupiter III is typically used for wafer descumming and ashing. The maximum sample size is 6 inches. The system is equipped with a maximum 300W RF power supply. The available process gases are oxygen, argon, and forming gas which are adjustable using a rotameter.文件
无文件
类别
Dry / Plasma Etch
上次验证： 7 天前
物品主要详细信息
状况：
Used
运行状况:
Installed / Running
产品编号：
145811
晶圆尺寸：
未知
年份：
未知
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
NORDSON / MARCH
Jupiter III
类别
Dry / Plasma Etch
上次验证： 7 天前
物品主要详细信息
状况：
Used
运行状况:
Installed / Running
产品编号：
145811
晶圆尺寸：
未知
年份：
未知
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
说明
无说明配置
无配置OEM 型号描述
The March Jupiter III is a parallel plate reactive ion etcher, which offers fast, uniform, and selective etching. The Jupiter III is typically used for wafer descumming and ashing. The maximum sample size is 6 inches. The system is equipped with a maximum 300W RF power supply. The available process gases are oxygen, argon, and forming gas which are adjustable using a rotameter.文件
无文件