说明
OXFORD Plasmalab 100 RIE (FL) Reactive Ion Etcher配置
Supports wafer sizes up to 300mm (330mm Platen) RIE set up for SiO2 Etch RF Generator : Advanced Energy RFX 600A ; 600W, 13.56MHz, Chamber Turbo Pump : Alcatel ATH 400M w/ ACT 600M controller Blue color PLC type Water cooled electrode 10C-80C Gas pod with 6 lines including following MFCs: Ar – 100sccm N2 – 200sccm CHF3 – 200sccm NF3 – 200sccm N2O – 200sccm Windows PC , user friendly interface Lauda WK 1200 Chiller was utilized by previous user. Not included.OEM 型号描述
未提供文件
无文件
类别
Dry / Plasma Etch
上次验证： 7 天前
物品主要详细信息
状况：
Refurbished
运行状况:
未知
产品编号：
138679
晶圆尺寸：
未知
年份：
2006
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
OXFORD
PLASMAPRO 100
类别
Dry / Plasma Etch
上次验证： 7 天前
物品主要详细信息
状况：
Refurbished
运行状况:
未知
产品编号：
138679
晶圆尺寸：
未知
年份：
2006
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
说明
OXFORD Plasmalab 100 RIE (FL) Reactive Ion Etcher配置
Supports wafer sizes up to 300mm (330mm Platen) RIE set up for SiO2 Etch RF Generator : Advanced Energy RFX 600A ; 600W, 13.56MHz, Chamber Turbo Pump : Alcatel ATH 400M w/ ACT 600M controller Blue color PLC type Water cooled electrode 10C-80C Gas pod with 6 lines including following MFCs: Ar – 100sccm N2 – 200sccm CHF3 – 200sccm NF3 – 200sccm N2O – 200sccm Windows PC , user friendly interface Lauda WK 1200 Chiller was utilized by previous user. Not included.OEM 型号描述
未提供文件
无文件