说明
无说明配置
Model: Plasmalab 100 ICP - Inductive Coupled Plasma Source (ICP380) - Max wafer size: 8"/200m diameter (8" platen) - X-20 PLC Controller - New Windows 10 PC - Cryo Table Option Equipped (-150C to +400C) - Mechanical Wafer Clamping - Backside Helium Cooling - Load-locked single chamber (ICP) - Alcatel Maglev Turbo Pump (Chamber) - Alcatel Turbo Pump (Load Lock) - Alcatel ACT Controller - Computer (see note below) - LCD Monitor, Keyboard, and Mouse - Load Lock Rough Pump - Chamber Rough PumpOEM 型号描述
Etching System文件
无文件
OXFORD
100 180 ICP
已验证
类别
Dry / Plasma Etch
上次验证： 60 多天前
物品主要详细信息
状况：
Used
运行状况:
Deinstalled
产品编号：
113484
晶圆尺寸：
8"/200mm
年份：
2008
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
OXFORD
100 180 ICP
类别
Dry / Plasma Etch
上次验证： 60 多天前
物品主要详细信息
状况：
Used
运行状况:
Deinstalled
产品编号：
113484
晶圆尺寸：
8"/200mm
年份：
2008
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
说明
无说明配置
Model: Plasmalab 100 ICP - Inductive Coupled Plasma Source (ICP380) - Max wafer size: 8"/200m diameter (8" platen) - X-20 PLC Controller - New Windows 10 PC - Cryo Table Option Equipped (-150C to +400C) - Mechanical Wafer Clamping - Backside Helium Cooling - Load-locked single chamber (ICP) - Alcatel Maglev Turbo Pump (Chamber) - Alcatel Turbo Pump (Load Lock) - Alcatel ACT Controller - Computer (see note below) - LCD Monitor, Keyboard, and Mouse - Load Lock Rough Pump - Chamber Rough PumpOEM 型号描述
Etching System文件
无文件