说明
Chuck: E-chuck STS Main Etch chamber(72” L x 24” W x 48” H): ASE Type of loadlock:Single Wafer Loadlock RF Power Chart(32” L x 24” W x 40” H): ENI ACG-3 and ENI ACG-10B Low electrode Chiller ( 32” L x 24” W x 32” H): Neslab CFT-75 Pumps and pumping lines: leybold Turbo Pump Chamber Backing Pump:N/A Loadlock Pump:N/A Computer and monitor STS remote gas cabinet (32” L x 13” W x 60” H), Air cannister (12” L x 12” W x 24” H) & accessories. 5 gas lines with 4 of MFCs including Cl2配置
无配置OEM 型号描述
The STS MULTIPLEX ICP is an etch system. The STS MULTIPLEX ICP can be used with 2” wafer sizes. It has a silicon material plate and ASE polymer system processer.文件
无文件
类别
Dry / Plasma Etch
上次验证： 7 天前
物品主要详细信息
状况：
Refurbished
运行状况:
未知
产品编号：
138672
晶圆尺寸：
未知
年份：
未知
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
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STS
MULTIPLEX ICP
类别
Dry / Plasma Etch
上次验证： 7 天前
物品主要详细信息
状况：
Refurbished
运行状况:
未知
产品编号：
138672
晶圆尺寸：
未知
年份：
未知
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
说明
Chuck: E-chuck STS Main Etch chamber(72” L x 24” W x 48” H): ASE Type of loadlock:Single Wafer Loadlock RF Power Chart(32” L x 24” W x 40” H): ENI ACG-3 and ENI ACG-10B Low electrode Chiller ( 32” L x 24” W x 32” H): Neslab CFT-75 Pumps and pumping lines: leybold Turbo Pump Chamber Backing Pump:N/A Loadlock Pump:N/A Computer and monitor STS remote gas cabinet (32” L x 13” W x 60” H), Air cannister (12” L x 12” W x 24” H) & accessories. 5 gas lines with 4 of MFCs including Cl2配置
无配置OEM 型号描述
The STS MULTIPLEX ICP is an etch system. The STS MULTIPLEX ICP can be used with 2” wafer sizes. It has a silicon material plate and ASE polymer system processer.文件
无文件