说明
ICP Etcher Complete配置
Was used to process Gallium Nitride and diamond Configured for chlorinated plasmas (Cl2 and BCL3 MFC fitted) with also Ar, O2 and N2.OEM 型号描述
未提供文件
无文件
STS
PRO ICP
类别
Dry / Plasma Etch
上次验证： 4 天前
物品主要详细信息
状况：
Used
运行状况:
未知
产品编号：
145586
晶圆尺寸：
未知
年份：
2007
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
说明
ICP Etcher Complete配置
Was used to process Gallium Nitride and diamond Configured for chlorinated plasmas (Cl2 and BCL3 MFC fitted) with also Ar, O2 and N2.OEM 型号描述
未提供文件
无文件