说明
(main unit only) Gas used N2 Ar WF6 CIF3 DCS 190-220VAC 50/60Hz配置
无配置OEM 型号描述
The MB2-730 is a highly reliable system designed for advanced process capability in tungsten and tungsten silicide CVD applications. It has been in production for 5 years and has proven to be a dominant tool in the CVD tungsten silicide market, with a market share of over 70%. This system is known for its reliability and advanced process capabilities, making it a popular choice for those in the industry.文件
无文件
TEL / TOKYO ELECTRON
MB2-730
已验证
类别
Dry / Plasma Etch
上次验证: 60 多天前
物品主要详细信息
状况:
Used
运行状况:
未知
产品编号:
70815
晶圆尺寸:
未知
年份:
1998
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
类似上架物品
查看全部TEL / TOKYO ELECTRON
MB2-730
类别
Dry / Plasma Etch
上次验证: 60 多天前
物品主要详细信息
状况:
Used
运行状况:
未知
产品编号:
70815
晶圆尺寸:
未知
年份:
1998
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
说明
(main unit only) Gas used N2 Ar WF6 CIF3 DCS 190-220VAC 50/60Hz配置
无配置OEM 型号描述
The MB2-730 is a highly reliable system designed for advanced process capability in tungsten and tungsten silicide CVD applications. It has been in production for 5 years and has proven to be a dominant tool in the CVD tungsten silicide market, with a market share of over 70%. This system is known for its reliability and advanced process capabilities, making it a popular choice for those in the industry.文件
无文件