说明
Off Status: COLD Dimension: 482*165*233 Weight Kg: 2,000.00 Missing Parts and Includes: Wip amplifier, EPO Power supply, 208V Power Supply配置
无配置OEM 型号描述
The Raider ECD is a system for 150mm-300mm single-wafer, automated, multi-chamber, electrochemical deposition that delivers high throughput in a small footprint. Electroplating on 300mm wafers employs an enhanced chamber reactor that is able to dynamically change the current density for unmatched uniformity. Some benefits of using the Raider ECD system include its ability to electroplate on ultra-thin and resistive seed layers through a multi-zone anode array. The system also saves on costs by using ionic membranes to extend chemistry life and “no teach” precision automation to eliminate automation re-teach down-time.文件
无文件
类别
Electro Plating
上次验证： 14 天前
物品主要详细信息
状况：
Used
运行状况:
未知
产品编号：
137170
晶圆尺寸：
未知
年份：
2006
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
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APPLIED MATERIALS (AMAT) / SEMITOOL
RAIDER ECD-312
类别
Electro Plating
上次验证： 14 天前
物品主要详细信息
状况：
Used
运行状况:
未知
产品编号：
137170
晶圆尺寸：
未知
年份：
2006
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
说明
Off Status: COLD Dimension: 482*165*233 Weight Kg: 2,000.00 Missing Parts and Includes: Wip amplifier, EPO Power supply, 208V Power Supply配置
无配置OEM 型号描述
The Raider ECD is a system for 150mm-300mm single-wafer, automated, multi-chamber, electrochemical deposition that delivers high throughput in a small footprint. Electroplating on 300mm wafers employs an enhanced chamber reactor that is able to dynamically change the current density for unmatched uniformity. Some benefits of using the Raider ECD system include its ability to electroplate on ultra-thin and resistive seed layers through a multi-zone anode array. The system also saves on costs by using ionic membranes to extend chemistry life and “no teach” precision automation to eliminate automation re-teach down-time.文件
无文件