说明
Ellipso Meter配置
Elli-SE-(UV)-FM12 Elli - SE System Specification FEATURE Easy Operation & Fast Measurement Non-contact & Non-destructive High Reproducibility 2D, 3D Mapping Data Display Multi-Layer Measurement 1.0. Performance 1.1 Wavelength range 240 nm~1,000 nm 1.2 Beam spot size ≥ 1.5 mm 1.3 Measuring constants Film thickness, n, k vs λ 1.4Thickness range sub Å ~ 10 μm (depends on film type) 1.5 Number of layers Up to 10 layers (depends on film type) 1.6 Throughput 1 10~15sec. per point (depends on film type) Option: High speed measurement 1.5sec. per point 1.7 Repeatability2 (3σ) ± 0.3 Å on 10 times measurement 1.8 Dispersion relations Cauchy, Sellmeier, Lorentz, Tauc-Lorentz, Quantum-Mechanical and more 1.9 Providing features Refractive Index, Extinction coefficient and optical band gap Film density and composition Material’s dielectrics function library User defined model capability Elli- SE- U System Specification 2.0. Ellipsometer system 2.1. Light source Tungsten halogen & Deuterium lamp (200 nm ~ 1,000 nm) Collimating lens system 2.2. Spot size Standard ≥ 1.5 mm 2.3. Polarizer module UV Collimating optic system Rotating polarizer: Micro Stepping motor control 2.4. Analyzer module UV Collimating optic system Rotating analyzer: Micro Stepping motor control 2.5. Spectrograph Wavelength range : 240 nm ~ 1,000 nm (CCD Type) Resolution : 1.5 nm FWHM, 2.6. Angle of incidence Manually variable angle of incidence 55˚~ 90˚ (5˚ Step) 2.7. Ellipsometric angles Psi : Range, 0˚ ~ 90˚ Repeatability, ≤ ± 0.02˚ Delta : Range, 0˚ ~ 180˚ Repeatability, ≤ ± 0.10˚ with retarder 2.8. Collimating system Auto Collimator 2.9. Auto 2D Mapping Stage 12 inch (300 mm Circle type) Mapping Software, Automatic Stage Control 3.0. Applications 3.1. Semiconductor Si, Ge, ONO, ZnO, PR, poly-Si, GaN, GaAs, Si3N4 3.2. Display(incl. OLED) MgO, ITO, PR, Alq3 , CuPc, PVK, PAF, PEDT-PSS, NPB, SiO2 ,ONO 3.3. Dielectrics SiO2 , TiO2 , Ta2O5 , ITO, AIN, ZrO2 , Si3N4 , Ga2O3 , Wet oxides 3.4. Polymer Dye, NPB, MNA, PVA, PET, TAC, PR 3.5. Chemistry Organic film(OLED) & LB Thin film 3.6. Solar cell SiN, a-Si, poly-Si, SiO2 , Al2O3 4.0. Foot print and weight 4.1. Foot print 600mm(H) x 480mm(D) x 630mm(W) ( excluding computer system) 4.2. Weight 35kgOEM 型号描述
Measuring constants: Film thickness, n, k vs λ Thickness range: sub Å ~ 10 μm (depends on film type) Wavelength range: 220 ~ 850 nm (uv) or 380 ~ 1050 nm Option of Spectral Range - (Duv:193nm, IR: 900nm ~ 1700nm, 900nm~ 2,200nm)文件
无文件
Ellipso Technology
Elli-SE
已验证
类别
Elipsometry
上次验证: 60 多天前
物品主要详细信息
状况:
Used
运行状况:
未知
产品编号:
89696
晶圆尺寸:
未知
年份:
2009
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
Ellipso Technology
Elli-SE
类别
Elipsometry
上次验证: 60 多天前
物品主要详细信息
状况:
Used
运行状况:
未知
产品编号:
89696
晶圆尺寸:
未知
年份:
2009
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
说明
Ellipso Meter配置
Elli-SE-(UV)-FM12 Elli - SE System Specification FEATURE Easy Operation & Fast Measurement Non-contact & Non-destructive High Reproducibility 2D, 3D Mapping Data Display Multi-Layer Measurement 1.0. Performance 1.1 Wavelength range 240 nm~1,000 nm 1.2 Beam spot size ≥ 1.5 mm 1.3 Measuring constants Film thickness, n, k vs λ 1.4Thickness range sub Å ~ 10 μm (depends on film type) 1.5 Number of layers Up to 10 layers (depends on film type) 1.6 Throughput 1 10~15sec. per point (depends on film type) Option: High speed measurement 1.5sec. per point 1.7 Repeatability2 (3σ) ± 0.3 Å on 10 times measurement 1.8 Dispersion relations Cauchy, Sellmeier, Lorentz, Tauc-Lorentz, Quantum-Mechanical and more 1.9 Providing features Refractive Index, Extinction coefficient and optical band gap Film density and composition Material’s dielectrics function library User defined model capability Elli- SE- U System Specification 2.0. Ellipsometer system 2.1. Light source Tungsten halogen & Deuterium lamp (200 nm ~ 1,000 nm) Collimating lens system 2.2. Spot size Standard ≥ 1.5 mm 2.3. Polarizer module UV Collimating optic system Rotating polarizer: Micro Stepping motor control 2.4. Analyzer module UV Collimating optic system Rotating analyzer: Micro Stepping motor control 2.5. Spectrograph Wavelength range : 240 nm ~ 1,000 nm (CCD Type) Resolution : 1.5 nm FWHM, 2.6. Angle of incidence Manually variable angle of incidence 55˚~ 90˚ (5˚ Step) 2.7. Ellipsometric angles Psi : Range, 0˚ ~ 90˚ Repeatability, ≤ ± 0.02˚ Delta : Range, 0˚ ~ 180˚ Repeatability, ≤ ± 0.10˚ with retarder 2.8. Collimating system Auto Collimator 2.9. Auto 2D Mapping Stage 12 inch (300 mm Circle type) Mapping Software, Automatic Stage Control 3.0. Applications 3.1. Semiconductor Si, Ge, ONO, ZnO, PR, poly-Si, GaN, GaAs, Si3N4 3.2. Display(incl. OLED) MgO, ITO, PR, Alq3 , CuPc, PVK, PAF, PEDT-PSS, NPB, SiO2 ,ONO 3.3. Dielectrics SiO2 , TiO2 , Ta2O5 , ITO, AIN, ZrO2 , Si3N4 , Ga2O3 , Wet oxides 3.4. Polymer Dye, NPB, MNA, PVA, PET, TAC, PR 3.5. Chemistry Organic film(OLED) & LB Thin film 3.6. Solar cell SiN, a-Si, poly-Si, SiO2 , Al2O3 4.0. Foot print and weight 4.1. Foot print 600mm(H) x 480mm(D) x 630mm(W) ( excluding computer system) 4.2. Weight 35kgOEM 型号描述
Measuring constants: Film thickness, n, k vs λ Thickness range: sub Å ~ 10 μm (depends on film type) Wavelength range: 220 ~ 850 nm (uv) or 380 ~ 1050 nm Option of Spectral Range - (Duv:193nm, IR: 900nm ~ 1700nm, 900nm~ 2,200nm)文件
无文件