说明
Miissing parts: Process Kits , Pyrometer Upper Wafer Size Range Minimum 200 mm Maximum 200 mm Set Size 200 mm Number of Chambers 2 Other Information Conversion June 2007 SPU to EPI System Exterior Dimensions Width 79.528 in (202.0 cm) Depth 81.496 in (207.0 cm) Height 95.669 in (243.0 cm) Weight 5,291 lb (2,400 kg)配置
无配置OEM 型号描述
Applied Centura RP (reduced pressure) Epi systems.文件
无文件
类别
Epitaxial deposition (EPI)
上次验证： 4 天前
物品主要详细信息
状况：
Used
运行状况:
未知
产品编号：
147415
晶圆尺寸：
8"/200mm
年份：
1996
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
类似上架物品
查看全部
APPLIED MATERIALS (AMAT)
CENTURA RP EPI
类别
Epitaxial deposition (EPI)
上次验证： 4 天前
物品主要详细信息
状况：
Used
运行状况:
未知
产品编号：
147415
晶圆尺寸：
8"/200mm
年份：
1996
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
说明
Miissing parts: Process Kits , Pyrometer Upper Wafer Size Range Minimum 200 mm Maximum 200 mm Set Size 200 mm Number of Chambers 2 Other Information Conversion June 2007 SPU to EPI System Exterior Dimensions Width 79.528 in (202.0 cm) Depth 81.496 in (207.0 cm) Height 95.669 in (243.0 cm) Weight 5,291 lb (2,400 kg)配置
无配置OEM 型号描述
Applied Centura RP (reduced pressure) Epi systems.文件
无文件