说明
无说明配置
PolyGen Chamber Single wf Boron doped poly deposition @ reduced pressure (gas: B2H6, SiH4; pressure 275 Torr; temperature: 730 C) Chamber: POLYgen 200 TPCC The chamber was UP and running before decommissioning, installed on AMAT CENTURA mainframe in position “D”OEM 型号描述
The Centura is Applied’s most versatile platform. Launched in 1992, over 8,000 Centura systems have been shipped to customers around the world. For ≤200mm fabrication the applications supported include CVD, epitaxy, etch, plasma nitridation and RTP文件
无文件
APPLIED MATERIALS (AMAT)
CENTURA 5200 TPCC
已验证
类别
Epitaxial deposition (EPI)
物品主要详细信息
状况：
Used
运行状况:
未知
产品编号：
27602
晶圆尺寸：
未知
年份：
未知
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
APPLIED MATERIALS (AMAT)
CENTURA 5200 TPCC
已验证
类别
Epitaxial deposition (EPI)
上次验证： 60 多天前
物品主要详细信息
状况：
Used
运行状况:
未知
产品编号：
27602
晶圆尺寸：
未知
年份：
未知
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
说明
无说明配置
PolyGen Chamber Single wf Boron doped poly deposition @ reduced pressure (gas: B2H6, SiH4; pressure 275 Torr; temperature: 730 C) Chamber: POLYgen 200 TPCC The chamber was UP and running before decommissioning, installed on AMAT CENTURA mainframe in position “D”OEM 型号描述
The Centura is Applied’s most versatile platform. Launched in 1992, over 8,000 Centura systems have been shipped to customers around the world. For ≤200mm fabrication the applications supported include CVD, epitaxy, etch, plasma nitridation and RTP文件
无文件