概述

Introducing the PE 2061 S Reactor: A field-proven epitaxial wafer production solution, specially designed for severe applications like PowerMos, Discrete, IGBT, and special devices up to 250 microns per 200 Ohm x cm. With its compact barrel design, atmospheric and reduced pressure process capabilities, and one-pass gas flow low frequency inductive heating, it's the top choice for leading semiconductor manufacturers worldwide. Experience efficient wafer handling in a class 10 environment, accommodating 4'', 5'', 6'', and 8'' wafers. Optimize your Clean Room space with its through the wall mounting configuration.