说明
26M06配置
无配置OEM 型号描述
Introducing the PE 2061 S Reactor: A field-proven epitaxial wafer production solution, specially designed for severe applications like PowerMos, Discrete, IGBT, and special devices up to 250 microns per 200 Ohm x cm. With its compact barrel design, atmospheric and reduced pressure process capabilities, and one-pass gas flow low frequency inductive heating, it's the top choice for leading semiconductor manufacturers worldwide. Experience efficient wafer handling in a class 10 environment, accommodating 4'', 5'', 6'', and 8'' wafers. Optimize your Clean Room space with its through the wall mounting configuration.文件
无文件
LPE
2061S
类别
Epitaxial deposition (EPI)
上次验证： 6 天前
物品主要详细信息
状况：
Used
运行状况:
未知
产品编号：
150056
晶圆尺寸：
6"/150mm
年份：
2002
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
说明
26M06配置
无配置OEM 型号描述
Introducing the PE 2061 S Reactor: A field-proven epitaxial wafer production solution, specially designed for severe applications like PowerMos, Discrete, IGBT, and special devices up to 250 microns per 200 Ohm x cm. With its compact barrel design, atmospheric and reduced pressure process capabilities, and one-pass gas flow low frequency inductive heating, it's the top choice for leading semiconductor manufacturers worldwide. Experience efficient wafer handling in a class 10 environment, accommodating 4'', 5'', 6'', and 8'' wafers. Optimize your Clean Room space with its through the wall mounting configuration.文件
无文件