说明
For EGV-30GX Vertical Eqitaxial Reactor System 4"Susceptor NuFlare EGV-30GX 4" Susceptor (Covalent Material) φ740mm The Susceptor serves functions such as wafer positioning, uniform heat conduction, and improving the flow field of reactive gases with rotation.配置
Size: - φ740mm - φ100mm Thickness: - 14.4mm Weight: - 10KgOEM 型号描述
Epitaxial reactor (CVD/epitaxial growth system) used in semiconductor manufacturing文件
无文件
NUFLARE
EGV-30GX
类别
Epitaxial deposition (EPI)
上次验证： 13 天前
物品主要详细信息
状况：
Parts Tool
运行状况:
未知
产品编号：
152533
晶圆尺寸：
未知
年份：
2015
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
说明
For EGV-30GX Vertical Eqitaxial Reactor System 4"Susceptor NuFlare EGV-30GX 4" Susceptor (Covalent Material) φ740mm The Susceptor serves functions such as wafer positioning, uniform heat conduction, and improving the flow field of reactive gases with rotation.配置
Size: - φ740mm - φ100mm Thickness: - 14.4mm Weight: - 10KgOEM 型号描述
Epitaxial reactor (CVD/epitaxial growth system) used in semiconductor manufacturing文件
无文件