说明
Mainframe配置
(Qty 4) Chambers Process: Anisotrop Procedure: TrenchOEM 型号描述
The Applied Materials Centura HART Etch System is a 200mm multi-chamber semiconductor processing platform designed primarily for high-aspect-ratio trench (HART) etching.文件
无文件
类别
Etch/Asher
上次验证： 18 天前
物品主要详细信息
状况：
Used
运行状况:
未知
产品编号：
148033
晶圆尺寸：
8"/200mm
年份：
2002
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
APPLIED MATERIALS (AMAT)
CENTURA HART
类别
Etch/Asher
上次验证： 18 天前
物品主要详细信息
状况：
Used
运行状况:
未知
产品编号：
148033
晶圆尺寸：
8"/200mm
年份：
2002
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
说明
Mainframe配置
(Qty 4) Chambers Process: Anisotrop Procedure: TrenchOEM 型号描述
The Applied Materials Centura HART Etch System is a 200mm multi-chamber semiconductor processing platform designed primarily for high-aspect-ratio trench (HART) etching.文件
无文件