说明
ASHER配置
无配置OEM 型号描述
The GAMMA 2100 200mm photoresist removal system uses a plasma source to strip photoresist. The GAMMA architecture features a multi-station sequential processing design with six strip stations, resulting in high wafer throughput with a minimal number of critical subsystems.文件
无文件
LAM RESEARCH / NOVELLUS / GASONICS
GAMMA 2100
已验证
类别
Etch/Asher
上次验证： 8 天前
物品主要详细信息
状况：
Used
运行状况:
未知
产品编号：
111882
晶圆尺寸：
8"/200mm
年份：
2002
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
LAM RESEARCH / NOVELLUS / GASONICS
GAMMA 2100
类别
Etch/Asher
上次验证： 8 天前
物品主要详细信息
状况：
Used
运行状况:
未知
产品编号：
111882
晶圆尺寸：
8"/200mm
年份：
2002
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
说明
ASHER配置
无配置OEM 型号描述
The GAMMA 2100 200mm photoresist removal system uses a plasma source to strip photoresist. The GAMMA architecture features a multi-station sequential processing design with six strip stations, resulting in high wafer throughput with a minimal number of critical subsystems.文件
无文件