ILD-4100
类别
Dry Etch概述
Anelva: ILD-4100 three-chamber cluster tool. Helicon wave source licensed from Plasma and Materials Technology (MORI source), can be configured with Helicon, RIE, and microwave downstream asher chambers, metal etch, poly etch processes.
活动的上架物品
1
服务
检验、保险、评估、物流