说明
无说明配置
4 Tubes (2 Atmospheric / 2 LPCVD) Tube 1 - (Atm) Diffusion growth of SiO2 films utilizing either ‘Thermal’ or ‘Wet’ oxidation (up to 1100C) Tube 2 - (Atm) Forming gas anneal (up to 800C) Tube 3 - LPCVD SiO2 deposition at lower temperatures (up to 800C) Tube 4 - LPCVD Si3N4 (up to 800C)OEM 型号描述
Furnance文件
无文件
EXPERTECH
HTR
已验证
类别
Furnaces / Diffusion
上次验证： 60 多天前
物品主要详细信息
状况：
Used
运行状况:
未知
产品编号：
103682
晶圆尺寸：
未知
年份：
未知
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
EXPERTECH
HTR
类别
Furnaces / Diffusion
上次验证： 60 多天前
物品主要详细信息
状况：
Used
运行状况:
未知
产品编号：
103682
晶圆尺寸：
未知
年份：
未知
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
说明
无说明配置
4 Tubes (2 Atmospheric / 2 LPCVD) Tube 1 - (Atm) Diffusion growth of SiO2 films utilizing either ‘Thermal’ or ‘Wet’ oxidation (up to 1100C) Tube 2 - (Atm) Forming gas anneal (up to 800C) Tube 3 - LPCVD SiO2 deposition at lower temperatures (up to 800C) Tube 4 - LPCVD Si3N4 (up to 800C)OEM 型号描述
Furnance文件
无文件