说明
Purpose: Al2O3 ALD Film deposition -Monolayer Al2O3 or TiO2 deposition -Thermal chemical reaction for deposition. -Batch type process. ~Å to 10nm is the typical process. -300oC is the typical setting for deposition.配置
Chemicals: TMA, TiCl4 Process type: Batch type process Pumping system: -Ebrara M802N-BE*2, -Ebrara EV-S20P*2 (1 set for service, 1 set for spare) Local Scrubber: Kanken Techno KT1000MFH Foundation: 1* Standalone typeOEM 型号描述
"VERTRON-III(J3). Model Numbers: DD-853V/DJ-853V. Hitachi Kokusai Electric's Vertron-III series Vertical Diffusion/LPCVD systems have been developed especially for 200mm wafers which are predominantly used in high-volume-semiconductor device manufacturing. The Vertron-III platform offers solid reliability and provides superior cost of ownership (Co0)to our customers. The Vertron-III offers all conventional films as well as the unique processes of BTBAS Si3N4, and Selective SiGe epitaxy. Hitachi Kokusai is recognized as a leader in thermal solutions and customer satisfaction."文件
无文件
类别
Furnaces / Diffusion
上次验证： 2 天前
物品主要详细信息
状况：
New
运行状况:
未知
产品编号：
147938
晶圆尺寸：
未知
年份：
2021
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
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KOKUSAI-ELECTRIC (KE)
DJ 853V
类别
Furnaces / Diffusion
上次验证： 2 天前
物品主要详细信息
状况：
New
运行状况:
未知
产品编号：
147938
晶圆尺寸：
未知
年份：
2021
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
说明
Purpose: Al2O3 ALD Film deposition -Monolayer Al2O3 or TiO2 deposition -Thermal chemical reaction for deposition. -Batch type process. ~Å to 10nm is the typical process. -300oC is the typical setting for deposition.配置
Chemicals: TMA, TiCl4 Process type: Batch type process Pumping system: -Ebrara M802N-BE*2, -Ebrara EV-S20P*2 (1 set for service, 1 set for spare) Local Scrubber: Kanken Techno KT1000MFH Foundation: 1* Standalone typeOEM 型号描述
"VERTRON-III(J3). Model Numbers: DD-853V/DJ-853V. Hitachi Kokusai Electric's Vertron-III series Vertical Diffusion/LPCVD systems have been developed especially for 200mm wafers which are predominantly used in high-volume-semiconductor device manufacturing. The Vertron-III platform offers solid reliability and provides superior cost of ownership (Co0)to our customers. The Vertron-III offers all conventional films as well as the unique processes of BTBAS Si3N4, and Selective SiGe epitaxy. Hitachi Kokusai is recognized as a leader in thermal solutions and customer satisfaction."文件
无文件