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说明
dry oxidation at temperatures between 700 -1150°C. Batches of up to 50 wafers (4 to 6”) low pressure chemical vapor deposition (LPCVD) tool used for silicon nitride deposition at temperature between 700-850°C with batches of up to 50 wafers (4 to 6”)配置
MRL Cyclone 630 Configured: 4 to 6" Tube 1: LPCVD Silicon Nitride, used for silicon nitride deposition at temperatures between 700-850°C Tube 2: Dry Oxidation at temperatures between 700 -1150°C Tube 3: N/A Tube 4: N/AOEM 型号描述
未提供文件
无文件
类别
Furnaces / Diffusion
上次验证： 60 多天前
物品主要详细信息
状况：
Used
运行状况:
未知
产品编号：
111178
晶圆尺寸：
未知
年份：
未知
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
MRL
Cyclone 630
类别
Furnaces / Diffusion
上次验证： 60 多天前
物品主要详细信息
状况：
Used
运行状况:
未知
产品编号：
111178
晶圆尺寸：
未知
年份：
未知
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
说明
dry oxidation at temperatures between 700 -1150°C. Batches of up to 50 wafers (4 to 6”) low pressure chemical vapor deposition (LPCVD) tool used for silicon nitride deposition at temperature between 700-850°C with batches of up to 50 wafers (4 to 6”)配置
MRL Cyclone 630 Configured: 4 to 6" Tube 1: LPCVD Silicon Nitride, used for silicon nitride deposition at temperatures between 700-850°C Tube 2: Dry Oxidation at temperatures between 700 -1150°C Tube 3: N/A Tube 4: N/AOEM 型号描述
未提供文件
无文件