The VIISta Trident system is the semiconductor industry’s most advanced single-wafer high-current implanter. The system leverages the VIISta high-current ion implant platform’s production-proven, single-wafer architecture to set new benchmarks for energy contamination, uniformity, and angle and dose rate control to meet advanced node requirements with high yield and the highest productivity

November 10, 2011 – Applied Materials, Inc. announced the successful completion of its acquisition of Varian Semiconductor Equipment Associates, Inc. 
Varian is the leading supplier of ion implantation equipment used by chip makers and has been applying this technology to crystalline silicon wafers for photovoltaic panels. Varian will operate as a business unit of Applied's Silicon Systems Group.

APPLIED MATERIALS (AMAT) / VARIAN

VIISta TRIDENT

In 2000, Eaton spun off Axcelis as a separate company, and Axcelis inherited Eaton’s 50-percent ownership stake in the joint venture. SEN, licenses technology from Axcelis for ion implantation, has exclusive rights to the territory of Japan and is the leading producer of ion implantation equipment in Japan. In 2009, the merger between Axcelis Technologies and Sumitomo Heavy Industries dissolved—Sumitomo became the sole parent company, and with this, the company name changed to SEN Corporation. 

SEN CORPORATION / SUMITOMO

GSD III LED

Designed for the emerging 300mm market, Quantum utilizes the differential lens technology of the xRLEAP system. Enhanced beam optics further improve the low-energy productivity over the xRLEAP system. High beam currents combined with fast auto-tune capability make Quantum the most effective ion implanter for 130nm and below applications in the industry. New technology for energy control ensures excellent energy accuracy and ultra-low energy implants to a remarkable ±7.5 volts. Quantum is a production-proven platform capable of performing conductive doping for several device generations into the future.

The Quantum series of implanters are used for "conductive" implant applications traditionally performed by high-current implant systems. The Quantum series includes the Quantum 80 and 120 (2 keV to 80/120 keV) and the Quantum LEAP system that extends ultra-low-energy performance to 200eV. All Quantum systems use a small-footprint platform that bridges 200mm and 300mm wafer sizes. The system's extremely short beam path minimizes beam "blow up'' and energy contamination with new technology that ensures energy accuracy and control to ±0.5% for ultra-low energy implants. Although the Quantum beamline excels at low energy implantation, the system also provides excellent performance in mid-energy (10-80keV) implants. Its high current levels give high production throughput and lower cost of ownership. The market-leading Quantum LEAP system has been rapidly accepted by chipmakers in all regions for ultra-shallow junction formation, enabling smaller transistors and higher device speeds

Applied Materials is committed to accelerating this new PPACt playbook for our customers and partners. We have the broadest and deepest portfolio of products for delivering PPACt innovations to the market. This portfolio encompasses the ability to create and deposit, shape and remove, modify, analyze, and connect materials and devices in new ways. We are unique in having a broad suite of process technology and metrology capabilities under one roof, and we have highly differentiated silicon and packaging lab capabilities. Our Integrated Materials Solutions co-optimize materials deposition, removal, modification, and analysis to create new materials and engineer new structures for high-performance, low-power chips at leading-edge nodes.

APPLIED MATERIALS (AMAT)

QUANTUM III

The NV-GSD-A high-current ion implanter with increased beam current and improved throughput with 200-mm wafers.

High Current

概述

服务

High Current 的制造商

High Current 的热门产品

VIISta TRIDENT

GSD III LED

QUANTUM III

NV GSD A