VIISta HCP
概述
The VIISta HCP series is a high current single wafer ion implanter that offers high productivity and excellent contamination performance. It features implant angle accuracy, beam steering correction, and high-tilt angle capability, making it suitable for advanced device fabrication. With its excellent process control capability, the VIISta HCP is ideal for advanced ultra shallow junction applications such as source/drain, source/drain extension, gate doping, pre-amorphization, and materials modification. It has an energy range of 200 eV to 60 keV and a dose range of 1 x 10^13 to 5 x 10^16 ions/cm^-2.
活动的上架物品
4
服务
检验、保险、评估、物流
热门上架物品
APPLIED MATERIALS (AMAT) / VARIAN
VIISta HCP
High Current年份: 2006状况: 二手上次验证60 多天前APPLIED MATERIALS (AMAT) / VARIAN
VIISta HCP
High Current年份: 状况: 二手上次验证4 天前APPLIED MATERIALS (AMAT) / VARIAN
VIISta HCP
High Current年份: 2006状况: 二手上次验证60 多天前APPLIED MATERIALS (AMAT) / VARIAN
VIISta HCP
High Current年份: 状况: 零件工具上次验证60 多天前