We value your privacy
We and our selected partners use cookies to enhance your browsing experience, serve personalized content, and analyze our traffic. By clicking "Accept All", you consent to our use of cookies. 阅读更多
iSTAR
概述
iStar is a low energy, high current batch mode ion implanter suitable for ultra shallow junction (USJ) formation for advanced technology nodes. Its tall beam design is a breakthrough technology that achieves high beam current (2mA) at extremely low energy (100eV) without sacrificing throughput. The low energy beam current for iStar is about 2x to 4x higher than other high current implanters AIBT claimed.
活动的上架物品
2
服务
检验、保险、评估、物流
