说明
无说明配置
Implant Quantum Leap System Software Version: 4.13-00z Beta CIM: Linked Process: Low Energy ImplanterOEM 型号描述
Designed for the 300mm market, Quantum is an advanced ion implanter series that utilizes the differential lens technology of the xRLEAP system. It offers enhanced beam optics, resulting in improved low-energy productivity compared to the xRLEAP system. With high beam currents and fast auto-tune capability, Quantum is the industry's most effective ion implanter for applications at 130nm and below. Its new energy control technology ensures excellent energy accuracy and enables ultra-low energy implants with remarkable precision of ±7.5 volts. The This system provides conductive doping for multiple device generations, offering a small-footprint platform for both 200mm and 300mm wafer sizes. The Quantum series excels at low-energy implantation while delivering excellent performance in mid-energy implants (10-80keV). With high current levels, it achieves high production throughput and lower cost of ownership. The market-leading Quantum LEAP system has gained rapid acceptance among chipmakers worldwide for its ability to form ultra-shallow junctions, enabling smaller transistors and higher device speeds.文件
APPLIED MATERIALS (AMAT)
QUANTUM II LEAP
已验证
类别
High Current
上次验证: 60 多天前
物品主要详细信息
状况:
Used
运行状况:
未知
产品编号:
104139
晶圆尺寸:
8"/200mm
年份:
2000
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
APPLIED MATERIALS (AMAT)
QUANTUM II LEAP
类别
High Current
上次验证: 60 多天前
物品主要详细信息
状况:
Used
运行状况:
未知
产品编号:
104139
晶圆尺寸:
8"/200mm
年份:
2000
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available