说明
Tool is still running production.配置
Gas Configuration Gas Type BF3 : SDS PH3 : SDS AsH3 : SDS External Facilities Connections : Ar | N2 Loading Configuration: SMIF Electrical Requirements : 208V / 250A GEM/SECS Interface : Yes SECS II Interface : Yes Energy Range : 80KeV Through Wafer – Wafer on Blade Sensor : Yes Hollow Gripper : Yes PEEK Moving Clips : Yes Ion Source Type : Bernas Plasma Flood System : Standard Source Material Type : Tungsten Arc Chamber Front Plate : Split Graphite Dual Vaporizers : No Post-Acceleration Tube/Turbo Pump : Leybold Process Chamber/Cryopumps : CTI OB10OEM 型号描述
The Precision Implant xR80 was introduced in October 1995. It features low-energy and a very small system footprint while maintaining high throughput.文件
无文件
APPLIED MATERIALS (AMAT)
xR80
已验证
类别
High Current
物品主要详细信息
状况：
Used
运行状况:
未知
产品编号：
16512
晶圆尺寸：
未知
年份：
2014
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
APPLIED MATERIALS (AMAT)
xR80
已验证
类别
High Current
上次验证： 60 多天前
物品主要详细信息
状况：
Used
运行状况:
未知
产品编号：
16512
晶圆尺寸：
未知
年份：
2014
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
说明
Tool is still running production.配置
Gas Configuration Gas Type BF3 : SDS PH3 : SDS AsH3 : SDS External Facilities Connections : Ar | N2 Loading Configuration: SMIF Electrical Requirements : 208V / 250A GEM/SECS Interface : Yes SECS II Interface : Yes Energy Range : 80KeV Through Wafer – Wafer on Blade Sensor : Yes Hollow Gripper : Yes PEEK Moving Clips : Yes Ion Source Type : Bernas Plasma Flood System : Standard Source Material Type : Tungsten Arc Chamber Front Plate : Split Graphite Dual Vaporizers : No Post-Acceleration Tube/Turbo Pump : Leybold Process Chamber/Cryopumps : CTI OB10OEM 型号描述
The Precision Implant xR80 was introduced in October 1995. It features low-energy and a very small system footprint while maintaining high throughput.文件
无文件