概述

The SEN Corporation / Sumitomo NV-GSDIII-LE is a best-selling high-current ion implantation system known for its high productivity in the low energy region. It supports implantation energy between 1 keV (0.2 keV with an optional deceleration mechanism) and 80 keV. The system ensures high beam current with minimal energy contamination, especially in the low energy range down to 1 keV (0.2 keV with the optional deceleration mechanism). It is equipped with a high-performance, long-life ion source (ELS) and delivers accurate implantation results. The NV-GSDIII-LE boasts high beam quality with low metal contamination and cross-contamination thanks to the adoption of advanced options like the VSD (Virtual Slit Disk) and TSDF (Triple Surface Disk Faraday). It incorporates a plasma shower system to minimize charge buildup and enhance process stability.