概述

Combining the most recent advances in focused ion and electron beams and expanding their combined use with the third generation of the Helios NanoLab. The Helios NanoLab G3 family is designed to explore the nanoscale dimension beyond any limit set by its predecessors, and adjust even more closely to the needs of scientists and engineers. New standards are set for characterizing samples with extreme high resolution (XHR), preparing samples with highest quality standards and rapidly fabricating functional prototypes, quickly and easily.