概述

High-performance laser annealing equipment that supports deep activation and double-pulse processes GBT back surface activation. This is a hybrid annealing system equipped with a solid-state laser and a long-wavelength laser that enables a unique double-pulse process. With high repetition rate and high pulse energy stability, maintenance-free, and compact design, which are the characteristics of solid-state lasers, it promotes the development of next-generation processes in the semiconductor field.