概述

Tandetron 1520 and Genus 1510. Introduced in 1995 and 1992, respectively, the Tandetron 1520 and Genus 1510 were Genus' previous generation MeV ion implant products. The 1510 is a second-generation high energy ion implanter and is an evolution of the market leader Genus 1500 system. In this work, a review of the key performance characteristics of the system are presented from a users point of view. Included are parameters such as beam current, beam stability, implant profiles, wafer throughput, particle performance, ease of operation, and serviceability.