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ESI 9820
  • ESI 9820
  • ESI 9820
  • ESI 9820
说明
无说明
配置
Minimum Spot Size (1/e2): 2.0μm Accuracy: .20μm Wavelength: 1.3μm – LightWave Laser rep rate: 30kHz Maximum cut velocity: 200mm/second Wafer Diameter 200mm / 300mm.(S‐type for 150mm)
OEM 型号描述
The Model 9820 is based on ESI’s highly successful 98XX platform, which was developed specifically for advanced DRAM, SRAM, embedded memory and other laser fuse applications. The 9820 offers a wide process window, and small spot sizes to address the requirements of most high-speed chips. The large-field 98XX platform minimizes alignment, stepping and other overhead factors that impact throughput, while auto-adjusting optics keep optical components perfectly aligned for optimal process performance and highest productivity. Capable of processing new generations of tight pitch fuses Designed for high volume, automated 300 mm production Wide range of processing applications – Poly Si, Al, and Cu capable New high-performance laser option
文件

无文件

verified-listing-icon

已验证

类别
Laser

上次验证: 60 多天前

物品主要详细信息

状况:

Used


运行状况:

Deinstalled


产品编号:

105420


晶圆尺寸:

6"/150mm, 8"/200mm, 12"/300mm


年份:

未知


Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available

ESI

9820

verified-listing-icon
已验证
类别
Laser
上次验证: 60 多天前
listing-photo-107c527f11e048c09c860e8116e2899e-https://d2pkkbyngq3xpw.cloudfront.net/moov_media/3.0-assets/photo-coming-soon-small.png
物品主要详细信息

状况:

Used


运行状况:

Deinstalled


产品编号:

105420


晶圆尺寸:

6"/150mm, 8"/200mm, 12"/300mm


年份:

未知


Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
说明
无说明
配置
Minimum Spot Size (1/e2): 2.0μm Accuracy: .20μm Wavelength: 1.3μm – LightWave Laser rep rate: 30kHz Maximum cut velocity: 200mm/second Wafer Diameter 200mm / 300mm.(S‐type for 150mm)
OEM 型号描述
The Model 9820 is based on ESI’s highly successful 98XX platform, which was developed specifically for advanced DRAM, SRAM, embedded memory and other laser fuse applications. The 9820 offers a wide process window, and small spot sizes to address the requirements of most high-speed chips. The large-field 98XX platform minimizes alignment, stepping and other overhead factors that impact throughput, while auto-adjusting optics keep optical components perfectly aligned for optimal process performance and highest productivity. Capable of processing new generations of tight pitch fuses Designed for high volume, automated 300 mm production Wide range of processing applications – Poly Si, Al, and Cu capable New high-performance laser option
文件

无文件